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ITO Sputtering Target
ITO Sputtering Target
- Purity---
- 99.995%
- Shape---
- Discs, Plate, Step, Rectangle, Sheet
- Dimension---
Discs, Plate, Step (Dia ≤480mm,Thickness≥1mm)
Rectangle, Sheet, Step (Length ≤410mm, Width ≤310mm, Thickness ≥1mm)
- Property---
- Application---
- ITO is often used to make transparent conductive coatings for displays such as liquid crystal displays, flat panel displays, plasma displays, touch panels, and electronic ink applications. Thin films of ITO are also used in organic light-emitting diodes, solar cells, antistatic coatings and EMI shieldings. In organic light-emitting diodes, ITO is used as the anode (hole injection layer).
Indium tin oxide (ITO) is a ternary composition of indium, tin and oxygen in varying proportions. Depending on the oxygen content, it can either be described as a ceramic or alloy. Indium tin oxide is typically encountered as an oxygen saturated composition with a formulation of 74% In, 18% O2, and 8% Sn by weight. Oxygen saturated compositions are so typical, that unsaturated compositions are termed oxygen deficient ITO. It is transparent and colorless in thin layers while in bulk form it is yellowish to grey. In the infrared region of the spectrum it acts as a metal-like mirror.
Indium tin oxide is one of the most widely used transparent conducting oxides because of its two chief properties, its electrical conductivity and optical transparency, as well as the ease with which it can be deposited as a thin film. As with all transparent conducting films, a compromise must be made between conductivity and transparency, since increasing the thickness and increasing the concentration of charge carriers will increase the material's conductivity, but decrease its transparency.
Thin films of indium tin oxide are most commonly deposited on surfaces by physical vapor deposition. Often used is electron beam evaporation, or a range of sputter deposition techniques.